English

Automated, deep reactive ion etching free fiber coupling to nanophotonic devices

Mesoscale and Nanoscale Physics 2022-01-19 v1

Abstract

Rapid development in integrated optoelectronic devices and quantum photonic architectures creates a need for optical fiber to chip coupling with low losses. Here we present a fast and generic approach that allows temperature stable self-aligning connections of nanophotonic devices to optical fibers. We show that the attainable precision of our approach is equal to that of DRIE-process based couplings. Specifically, the initial alignment precision is 1.2±0.4μm1.2\pm 0.4\mu m, the average shift caused by mating <0.5μm<0.5\mu m, which is in the order of the precision of the concentricity of the employed fiber, and the thermal cycling stability is <0.2μm<0.2\mu m. From these values the expected overall alignment offset is calculated as 1.4±0.4μm1.4 \pm 0.4\mu m. These results show that our process offers an easy to implement, versatile, robust and DRIE-free method for coupling photonic devices to optical fibers. It can be fully automated and is therefore scalable for coupling to novel devices for quantum photonic systems.

Keywords

Cite

@article{arxiv.2201.06328,
  title  = {Automated, deep reactive ion etching free fiber coupling to nanophotonic devices},
  author = {Fabian Flassig and Rasmus Flaschmann and Thomas Kainz and Sven Ernst and Stefan Strohauer and Christian Schmid and Lucio Zugliani and Kai Müller and Jonathan J. Finley},
  journal= {arXiv preprint arXiv:2201.06328},
  year   = {2022}
}

Comments

9 pages, 4 figures