Automated, deep reactive ion etching free fiber coupling to nanophotonic devices
Abstract
Rapid development in integrated optoelectronic devices and quantum photonic architectures creates a need for optical fiber to chip coupling with low losses. Here we present a fast and generic approach that allows temperature stable self-aligning connections of nanophotonic devices to optical fibers. We show that the attainable precision of our approach is equal to that of DRIE-process based couplings. Specifically, the initial alignment precision is , the average shift caused by mating , which is in the order of the precision of the concentricity of the employed fiber, and the thermal cycling stability is . From these values the expected overall alignment offset is calculated as . These results show that our process offers an easy to implement, versatile, robust and DRIE-free method for coupling photonic devices to optical fibers. It can be fully automated and is therefore scalable for coupling to novel devices for quantum photonic systems.
Keywords
Cite
@article{arxiv.2201.06328,
title = {Automated, deep reactive ion etching free fiber coupling to nanophotonic devices},
author = {Fabian Flassig and Rasmus Flaschmann and Thomas Kainz and Sven Ernst and Stefan Strohauer and Christian Schmid and Lucio Zugliani and Kai Müller and Jonathan J. Finley},
journal= {arXiv preprint arXiv:2201.06328},
year = {2022}
}
Comments
9 pages, 4 figures