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Atomistic Kinetic Monte Carlo Simulations of Polycrystalline Copper Electrodeposition

Chemical Physics 2014-07-22 v2 Materials Science Computational Physics

Abstract

A high-fidelity kinetic Monte Carlo (KMC) simulation method (T. Treeratanaphitak, M. Pritzker, N. M. Abukhdeir, Electrochim. Acta 121 (2014) 407--414) using the semi-empirical multi-body embedded-atom method (EAM) potential has been extended to model polycrystalline metal electrodeposition. Simulations using KMC-EAM are performed over a range of overpotentials to predict the effect on deposit texture evolution. Roughness-time power law behaviour (tβ\propto t^\beta) is observed where β=0.62±0.12\beta=0.62 \pm 0.12, which is in good agreement with past experimental results. Furthermore, the simulations provide insights into the dynamics of sub-surface deposit morphology which are not directly accessible from experimental measurements.

Keywords

Cite

@article{arxiv.1405.4559,
  title  = {Atomistic Kinetic Monte Carlo Simulations of Polycrystalline Copper Electrodeposition},
  author = {Tanyakarn Treeratanaphitak and Mark D. Pritzker and Nasser Mohieddin Abukhdeir},
  journal= {arXiv preprint arXiv:1405.4559},
  year   = {2014}
}

Comments

7 pages, 3 figures