Atomically imprinted graphene plasmonic cavities
Abstract
Plasmon polaritons in van der Waals (vdW) materials hold promise for next-generation photonics. The ability to deterministically imprint spatial patterns of high carrier density in cavities and circuitry with nanoscale features underlies future progress in nonlinear nanophotonics and strong light-matter interactions. Here, we demonstrate a general strategy to atomically imprint low-loss graphene plasmonic structures using oxidation-activated charge transfer (OCT). We cover graphene with a monolayer of WSe, which is subsequently oxidized into high work-function WOx to activate charge transfer. Nano-infrared imaging reveals low-loss plasmon polaritons at the WOx/graphene interface. We insert WSe spacers to precisely control the OCT-induced carrier density and achieve a near-intrinsic quality factor of plasmons. Finally, we imprint canonical plasmonic cavities exhibiting laterally abrupt doping profiles with single-digit nanoscale precision via programmable OCT. Specifically, we demonstrate technologically appealing but elusive plasmonic whispering-gallery resonators based on free-standing graphene encapsulated in WOx. Our results open avenues for novel quantum photonic architectures incorporating two-dimensional materials.
Cite
@article{arxiv.2206.12754,
title = {Atomically imprinted graphene plasmonic cavities},
author = {Brian S. Y. Kim and Aaron J. Sternbach and Min Sup Choi and Zhiyuan Sun and Francesco L. Ruta and Yinming Shao and Alexander S. McLeod and Lin Xiong and Yinan Dong and Anjaly Rajendran and Song Liu and Ankur Nipane and Sang Hoon Chae and Amirali Zangiabadi and Xiaodong Xu and Andrew J. Millis and P. James Schuck and Cory. R. Dean and James C. Hone and D. N. Basov},
journal= {arXiv preprint arXiv:2206.12754},
year = {2022}
}
Comments
17 pages, 4 figures