English

Atomic Distributions in Topological Insulator Bi$_2$Se$_{3-x}$Te$_x$

Materials Science 2016-12-15 v1

Abstract

Bi2_2Se3_3 is a topological insulator and it is often doped with Te to compensate the nn-type carriers due to Se vacancies. Different doping patterns of Te would influence the transport characteristics of the surface states. We study the Te atom distribution in Bi2_2Se3_3 with different Te concentrations, using first-principles density-functional-theory calculations. We show that Te prefer the outer layer, until the composition becomes Bi2_2SeTe2_2 and the outer layer is full of Te. And for a fixed ratio of Se and Te atoms within a single layer, we find that the structures with less number of adjacent Te-Se pairs tend to have lower energies. This might result in the formation of local Te clusters under low annealing temperatures.

Keywords

Cite

@article{arxiv.1612.04756,
  title  = {Atomic Distributions in Topological Insulator Bi$_2$Se$_{3-x}$Te$_x$},
  author = {Kaixin Huang and Haotian Zheng and Weidong Luo},
  journal= {arXiv preprint arXiv:1612.04756},
  year   = {2016}
}