Anomalous diffusion mediated by atom deposition into a porous substrate
Statistical Mechanics
2009-02-17 v1
Abstract
Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time
Cite
@article{arxiv.0902.2618,
title = {Anomalous diffusion mediated by atom deposition into a porous substrate},
author = {Pascal Brault and Christophe Josserand and Jean-Marc Bauchire and Amael Caillard and Christine Charles and Rod W. Boswell},
journal= {arXiv preprint arXiv:0902.2618},
year = {2009}
}
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4 pages